ELECTRON MICROSCOPE FOR LENGTH MEASUREMENT

Japanese Patent JP3509348

B2

PROBLEM TO BE SOLVED: To obtain an electron microscope in which the influence on a measurement of a contamination is reduced by computing the pattern size at a prescribed time on the basis of data on a time-dependent change in the pattern size accompanying irradiation with an electron beam.
SOLUTION: When a sample base 46 is moved, a sample 47 is moved to a designated position, and an electron beam 43 scans the sample 47 by a polariscope 49. Secondary electrons 50 generated from the surface of the sample 47 are detected by a secondary- electron detector 51, they are amplified 52 so as to become a brilliance modulation signal for a display device 53, and the signal is stored once in a storage device 55. This procedure is repeated, a processing unit 56 draws out a detection signal at every scanning operation from the device 55, and a pattern size is computed by, e.g. a steepest ascent or descent method regarding a signal obtained by adding the definite number of scanning lines. Then, the change with time in the pattern size is recorded, data on the change with time is extrapolated, and a size corresponding to the point of time of an electron-beam irradiation time of 0 is computed as a pattern size before irradiation with the electron beam. Thereby, the influence of a contamination is reduced, and the pattern size can be measured with high accuracy.

Yoshimura, Toshiyuki
Otaka, Tadashi
Terasawa, Tsuneo

JP32681995A

March 22, 2004

December 15, 1995

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HITACHI LTD

G01B15/00; G01B9/04; G01B15/08; G02B21/00; H01L21/66; (IPC1-7): G01B15/00; H01L21/66

Ｍ Ｔｅｎｃｅ， Ｍ Ｇ Ｗａｌｌｓ， Ｃ Ｊｅａｎｇｕｉｌｌａｕｍｅ， Ｃ Ｃｏｌｌｉｅｘ， Ｘ Ｔｈｏｍａｓ， Ｏ Ｊｂａｒａ ａｎｄ Ｊ Ｃａｚａｕｘ，”Ｅｌｅｃｔｒｏｎ ｉｒｒａｄｉａｔｉｏｎ ｅｆｆｅｃｔｓ：ａ ｔｉｍｅ−ｅｎｅｒｇｙ ｒｅｐｒｅｓｅｎｔａｔｉｏｎ”，Ｉｎｓｔｉｔｕｔｅ ｏｆ Ｐｈｙｓｉｃｓ Ｃｏｎｆｅｒｅｎｃｅ Ｓｅｒｉｅｓ，１９９０年，Ｎｏ．９８， Ｖｏｌ．１，ｐ．３１１−３１４

作田 康夫

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