Title:
ELECTRON MICROSCOPE AND SAMPLE CONTAMINATION PREVENTION METHOD
Document Type and Number:
Japanese Patent JP2022162682
Kind Code:
A
Abstract:
To avoid a depositing contaminant on a sample in an electron microscope.SOLUTION: An anti-pollution irradiation installation 30 includes a generation unit 32 and a mirror unit 34. The generation unit 32 generates laser light. The mirror unit 34 has a mirror surface that reflects laser light. A sample 28 in an objective lens 20 is irradiated with the laser light reflected by the mirror surface. The laser light is composed of a pulse train. When the sample 28 is irradiated with the laser light before the sample observation, no contaminants are deposited on the sample 28 for a certain period thereafter.SELECTED DRAWING: Figure 1
Inventors:
KANEKO TAKESHI
OKOSHI NORIHIRO
JIMBO YU
PARK SANG TAE
OKOSHI NORIHIRO
JIMBO YU
PARK SANG TAE
Application Number:
JP2021067610A
Publication Date:
October 25, 2022
Filing Date:
April 13, 2021
Export Citation:
Assignee:
JEOL LTD
International Classes:
H01J37/26; H01J37/244
Domestic Patent References:
| JP2001236914A | 2001-08-31 | |||
| JPH0398244A | 1991-04-23 |
Foreign References:
| US20160005566A1 | 2016-01-07 |
Attorney, Agent or Firm:
Patent Attorney Corporation YKI International Patent Office