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Title:
ELECTRON RAY EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JP3223956
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide an electron ray exposure device such that transfer can be achieved through a short time of exposure even if a pattern to be drawn on a sample has no repeated patterns or is made up of various patterns.
SOLUTION: This device is provided with an electron emitting device 1, in which a number of openings 27 serving as very small electron emission holes are arranged lengthwise and crosswise at small intervals, an application control device 2 by which some of electron emission elements 24 in time openings 27 are selected and independently applied with electron exciting voltages, and an application power supply 3. The number and position coordinates of the electron emission elements 24 to which the electron exciting voltages should be applied are preprogrammed, and the electron emission device 1 is operated, so that no matter what kind of pattern is contained in a pattern to be drawn, or whether or not repeated patterns exist, a region with a certain area is exposed in the same exposure time to complete transfer of the entire pattern.


Inventors:
Naoaki Aisaki
Application Number:
JP14040096A
Publication Date:
October 29, 2001
Filing Date:
June 03, 1996
Export Citation:
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Assignee:
NEC
International Classes:
H01J9/02; H01J37/063; H01J37/147; H01J37/305; H01L21/027; G03F7/20; (IPC1-7): H01J37/305; G03F7/20; H01J9/02; H01J37/063; H01J37/147; H01L21/027
Domestic Patent References:
JP7153655A
JP5251315A
Attorney, Agent or Firm:
Nobuyuki Kaneda (2 others)



 
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