Title:
ELECTROPHOTOGRAPHIC PHOTORECEPTOR
Document Type and Number:
Japanese Patent JP3634552
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a photoreceptor with a surface protective layer excellent in moisture resistance and environmental resistance with satisfactory controllability and stable quality in a small number of processes by forming a surface protective layer on an amorphous silicon photosensitive layer from a silicon nitride film having a specified hydrogen content.
SOLUTION: A layer 2 blocking the injection of electric charges and an amorphous silicon photosensitive layer 3 are sequentially formed on an electrically conductive substrate 1 and a surface protective layer 4 made of a silicon nitride (a-SiN:H) film having ≤3×1022 atoms/cm3 hydrogen content is formed as the top layer by an ECR-CVD method. Since the hydrogen content of the film is low, the film has superior water resistance and environmental resistance. The hydrogen content of the film is controlled by regulating the flow rate of gaseous SiH4 and the electric power of microwaves when the film is formed by the ECR-CVD method using gaseous SiH4 and N2 as raw materials.
Inventors:
Fuse Akihiro
Application Number:
JP10266397A
Publication Date:
March 30, 2005
Filing Date:
April 04, 1997
Export Citation:
Assignee:
株式会社リコー
International Classes:
G03G5/08; C23C16/42; C23C16/50; C23C16/511; G03G5/082; (IPC1-7): G03G5/08; C23C16/50
Domestic Patent References:
| JP5188618A | ||||
| JP60107035A | ||||
| JP882943A | ||||
| JP6342221A | ||||
| JP1321440A | ||||
| JP62153860A | ||||
| JP6281641A | ||||
| JP60135955A |
Attorney, Agent or Firm:
Eiji Tomomatsu
Toshikazu Kawashima
Toshikazu Kawashima
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