PURPOSE: To improve the mechanically and electrically contacting properties by forming the photoconductive layer with an org. semiconductor layer and an amorphous Si layer and to improve the mechanical durability by laying a surface coating layer made of silicon nitride.

CONSTITUTION: A photoconductive layer on a support is composed of a lower layer made of an org. semiconductor material and an upper layer made of amorphous Si. A surface coating layer is made of silicon nitride. The surface coating layer is laid by introducing reactive gases forming the layer into a deposition chamber, applying energy for electric discharge to the gases, and depositing the reaction product on the photoconductive layer.