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Title:
静電チャック及び基板処理装置
Document Type and Number:
Japanese Patent JP5270310
Kind Code:
B2
Abstract:
In an electrostatic chuck provided inside a processing chamber of a substrate processing apparatus and including a high voltage electrode plate for electrostatically attracting a target substrate, a heater includes a plate-shaped resistor and two electrode plates respectively brought into surface-contact with a front surface and a rear surface of the resistor, and one of the two electrode plates of the heater serves as the high voltage electrode plate for electrostatically attracting the target substrate.

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Inventors:
Shoichiro Matsuyama
Application Number:
JP2008291376A
Publication Date:
August 21, 2013
Filing Date:
November 13, 2008
Export Citation:
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Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/683; H02N13/00
Domestic Patent References:
JP9045756A
JP7297265A
JP54163118A
JP2004095665A
JP2002057207A
JP2008522446A
JP2000332089A
Attorney, Agent or Firm:
Another role Shigehisa
Satoshi Muramatsu



 
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