Title:
EMBROIDERY SYSTEM
Document Type and Number:
Japanese Patent JP2023175551
Kind Code:
A
Abstract:
To provide an embroidery system excellent in shadow expression of a pattern contour part formed by embroidery.SOLUTION: An embroidery system comprises: a range specifying part to specify a first range of a liner medium corresponding to a pattern contour part formed by embroidery on a fabric-like medium; a liquid discharge part that dyes the linear medium so as to form the pattern by embroidery using the linear medium and discharges a liquid to the liner medium so as to dye the first range in deeper or thinner color compared with a color of a second range other than the first range; and an embroidery part to do embroidery on the fabric-like medium using the linear medium to which the liquid was discharged.SELECTED DRAWING: Figure 6
Inventors:
SATO KAORU
Application Number:
JP2022088047A
Publication Date:
December 12, 2023
Filing Date:
May 30, 2022
Export Citation:
Assignee:
RICOH CO LTD
International Classes:
D05C11/24; B65H71/00; D05B67/00; D06B11/00; D06P5/00; D06P5/30
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Tadahiko Ito