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Title:
環境保護されたフォトニック集積回路
Document Type and Number:
Japanese Patent JP7362716
Kind Code:
B2
Abstract:
The invention relates to an environmentally protected PIC (1), comprising an InP-based substrate (2) having a first surface (3) that is at least partially provided with an InP-based optical waveguide (4), and a dielectric protective layer (5) arranged to cover at least the first surface of the InP-based substrate and the InP-based optical waveguide. The dielectric protective layer is configured to protect said PIC from environmental contaminants, to enable confinement of optical radiation in the dielectric protective layer in at least one direction that is transverse to a direction of propagation of the optical radiation, and to allow exchange of the optical radiation between the InP-based optical waveguide and the dielectric protective layer.The invention also relates to an opto-electronic system (18) comprising said PIC.

Inventors:
Ho Extras Jerk Hans
Application Number:
JP2021206566A
Publication Date:
October 17, 2023
Filing Date:
December 21, 2021
Export Citation:
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Assignee:
EFFECT Photonics B.V.
International Classes:
G02B6/122; G02B6/12
Domestic Patent References:
JP2017514167A
JP2010266541A
JP2001127378A
JP2000321452A
JP5043611A
JP2003513328A
Foreign References:
US20030223672
US6052397
KR1020110050167A
US20130251948
US20190204506
US20190013640
Attorney, Agent or Firm:
Hiroyoshi Aoki
Masayuki Amada
Toru Sugano