Title:
装置および装置の動作方法
Document Type and Number:
Japanese Patent JP5839240
Kind Code:
B2
Abstract:
An apparatus includes an arc chamber housing defining an arc chamber, and a feed system configured to feed a sputter target into the arc chamber. A method includes feeding a sputter target into an arc chamber defined by an arc chamber housing, and ionizing a portion of the sputter target.
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Inventors:
Chanei, Craig, Earl.
Application Number:
JP2013525951A
Publication Date:
January 06, 2016
Filing Date:
August 11, 2011
Export Citation:
Assignee:
Varian Semiconductor Equipment Associates, Inc.
International Classes:
H01J27/20; C23C14/48; H01J27/06; H01J27/08; H01J37/08; H01J37/317
Domestic Patent References:
| JP9025573A | ||||
| JP4354864A | ||||
| JP2003522299A | ||||
| JP2004052049A | ||||
| JP2002371351A |
Attorney, Agent or Firm:
Longhua International Patent Service Corporation