Title:
ETCHANT FOR SEMICONDUCTOR
Document Type and Number:
Japanese Patent JPH01133331
Kind Code:
A
Abstract:
PURPOSE: To heighten etching function by composing the liquid of a specific amount of hydrochloric acid, sulfuric acid, nitric acid, potassium bichromate and the rest of water.
CONSTITUTION: An etchant is composed of 1W10wt.% hydreochloric acid, 5W30wt.% sulfuric acid, 5W30wt.% nitric acid, 2W10wt.% potassium bichromate and the rest of water. Further, a better etching pit is produced by containing hydrofluoride less than 10wt.%. Thereby, the etching pit can be produced at a room temperature without using a special tool and a skilled technic.
Inventors:
NISHIKAWA HIRONOBU
UMENO MASAYOSHI
SOGA TETSUO
MIKURIYA NOBUO
KATO TOSHIHIRO
UMENO MASAYOSHI
SOGA TETSUO
MIKURIYA NOBUO
KATO TOSHIHIRO
Application Number:
JP29278887A
Publication Date:
May 25, 1989
Filing Date:
November 18, 1987
Export Citation:
Assignee:
NISHIKAWA HIRONOBU
DAIDO STEEL CO LTD
DAIDO STEEL CO LTD
International Classes:
G01N1/32; H01L21/308; H01L21/66; (IPC1-7): G01N1/32; H01L21/308; H01L21/66
Attorney, Agent or Firm:
Fujitani Osamu