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Title:
ETCHING LIQUID FOR COPPER OR COPPER ALLOY, AND METHOD FOR PRODUCING ELECTRONIC SUBSTRATE USING THE SAME
Document Type and Number:
Japanese Patent JP2004256901
Kind Code:
A
Abstract:

To provide an etching liquid for copper or a copper alloy capable of producing an electronic substrate in which side etches are reduced, the narrowing of the upper part of copper wiring is suppressed, and short circuits are not generated, and to provide a method for producing an electronic substrate using the same.

In the method for producing an electronic substrate, a copper layer (2a) formed on an electrically insulated base material (1) is etched so as to be a prescribed shape to form copper wiring (2c). After the main etching, copper (A) to be removed remaining in the cuff part of copper wiring (2b) is removed with an aqueous solution comprising (a) an oxidizer for copper by 1 to 50 g/L, (b) at least one kind of acid selected from the group consisting of hydrochloric acid and organic acid by 1 to 200 g/L, and (c) at least one kind of polymer selected from the group consisting of polyalkylene glycol and a copolymer of polyamine and polyalkylene glycol by 0.01 to 50 g/L.


Inventors:
TODA KENJI
Application Number:
JP2003051768A
Publication Date:
September 16, 2004
Filing Date:
February 27, 2003
Export Citation:
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Assignee:
MEC KK
International Classes:
C23F1/18; H05K3/06; (IPC1-7): C23F1/18; H05K3/06
Attorney, Agent or Firm:
Ikeuchi, Sato & Partners