Title:
評価方法、露光方法、および物品製造方法
Document Type and Number:
Japanese Patent JP7054365
Kind Code:
B2
Abstract:
An evaluation method for evaluating an aberration of a projection optical system in an exposure apparatus is provided. A first prediction coefficient of a first prediction formula for an aberration that is symmetrical with respect to an optical axis of the projection optical system is obtained, and a second prediction coefficient of a second prediction formula for an aberration that is asymmetrical with respect to the optical axis of the projection optical system is obtained. The aberration of the projection optical system is evaluated using the first prediction coefficient in a case where the shape of the illuminated region is determined as symmetrical with respect to the optical axis, and the aberration of the projection optical system is evaluated using the first and the second prediction coefficients in a case where the shape of the illuminated region is asymmetrical with respect to the optical axis.
Inventors:
Bunsuke Takeshita
Sumiyoshi Yuhei
Ken Minoru Sakamoto
Sumiyoshi Yuhei
Ken Minoru Sakamoto
Application Number:
JP2018100863A
Publication Date:
April 13, 2022
Filing Date:
May 25, 2018
Export Citation:
Assignee:
Canon Inc
International Classes:
G03F7/20; G01M11/02; G02B13/24
Domestic Patent References:
| JP2002015997A | ||||
| JP2015037124A | ||||
| JP2012222350A | ||||
| JP62229838A | ||||
| JP200916761A |
Attorney, Agent or Firm:
Patent Business Corporation Otsuka International Patent Office