Title:
蒸発源装置、成膜装置、成膜方法および電子デバイスの製造方法
Document Type and Number:
Japanese Patent JP7202971
Kind Code:
B2
Abstract:
The present invention provides an evaporation source apparatus, a film formation apparatus, a film formation method, and a manufacturing method of an electronic device which can perform control to maintain a constant deposition rate while maintaining the vicinity of an opening part of a container at a high temperature while preventing an excessive temperature increase by convenient control. A container (244) has an opening part (244e) to discharge a heated deposition material (242), a first area (244a), and a second area (244b) which is an area separated from the opening part (244e) more than the first area (244a). The evaporation source apparatus comprises: a first heater (246a) to heat the first area (244a); a second heater (246b) to heat the second area (244b); a control unit (270) to independently control the first heater (246a) and the second heater (246b); and a middle reflection member (241) arranged between the first heater (246a) and the second heater (246b) to reflect at least a portion of heat from at least the first heater (246a). Power supplied to the second heater (246b) is increased in accordance with a decrease in the deposition material accommodated in the container.
Inventors:
Yuki Sugawara
Yoshiaki Kazama
Yoshiaki Kazama
Application Number:
JP2019099034A
Publication Date:
January 12, 2023
Filing Date:
May 28, 2019
Export Citation:
Assignee:
Canon Tokki Co., Ltd.
International Classes:
C23C14/24; H05B33/10; H10K50/00; H10K59/00
Domestic Patent References:
| JP2011162846A | ||||
| JP2019031705A | ||||
| JP2008305735A | ||||
| JP2002124479A |
Attorney, Agent or Firm:
Patent Attorney Corporation Shuwa Patent Office
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