To draw a pattern with high accuracy even if height of a surface of a substrate fluctuates in scanning the substrate with optical beams by moving a chuck including the substrate mounted thereon by a stage.
The exposure device includes a height adjusting mechanism (a Z-tilt mechanism 9) for adjusting height of the chuck 10, and a detection device (a laser displacement gauge 47) for detecting fluctuation of height of the surface of the substrate 1 mounted on the chuck 10. Fluctuation of height of the surface of the substrate 1 mounted on the chuck 10 is detected by the detection device (the laser displacement gauge 47) while moving the chuck 10 by an X stage 5. The height of the chuck 10 is adjusted by the height adjusting mechanism (the Z-tilt mechanism 9) so that a focus of optical beams emitted from an optical beam irradiation device 20 is aligned with the surface of the substrate 1 based on the results of the detection. As a result, a pattern can be drawn with high accuracy even if the X stage 5 swings vertically to change the height of the surface of the substrate 1.
HAYASHI TOMOAKI
YOSHIDA MINORU
FUKUSHIMA MAKOTO
HONDA HIDEYUKI
HARA YASUHIKO
| JP2007047561A | 2007-02-22 | |||
| JP2005099094A | 2005-04-14 | |||
| JP2004253401A | 2004-09-09 |
Next Patent: EXPOSURE DEVICE, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE