Title:
EXPOSURE APPARATUS
Document Type and Number:
Japanese Patent JP2016109892
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an exposure apparatus in which an arrangement space for components can be maintained while avoiding increase in the scale.SOLUTION: An exposure apparatus 100 includes: a laser light source 130 that emits laser light LL; a polygon mirror 160 that scans the laser light LL emitted from the laser light source 130; a holding unit 110 that holds an exposure target substrate 200 and moves in a direction intersecting the scanning direction of the laser light LL; and a prism 157 that is disposed between the polygon mirror 160 and the holding unit 110 and has two reflection surfaces to change scanning directions of the laser light LL scanned by the polygon mirror 160.SELECTED DRAWING: Figure 1
Inventors:
SHIBUYA MUNEHIRO
Application Number:
JP2014247692A
Publication Date:
June 20, 2016
Filing Date:
December 08, 2014
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
G03F7/20; G02B26/12; H01L21/027; H05K3/00
Attorney, Agent or Firm:
Kazuaki Watanabe
Keisuke Nishida
Keisuke Nishida