Title:
露光装置及びデバイス製造方法
Document Type and Number:
Japanese Patent JP5406861
Kind Code:
B2
Abstract:
A scanning exposure apparatus exposes a plurality of shot regions on a substrate to light while scanning an original and the substrate. The apparatus includes: a stage which holds the substrate and moves; and a controller which controls movement of the stage based on a driving profile that defines the movement of the stage. A portion in the driving profile, which defines the movement of the stage during exposure of at least one shot region, is formed by a sine wave having a frequency lower than a resonance frequency in a stage controller.
Inventors:
Takenori Emoto
Harayama Chihiro
Harayama Chihiro
Application Number:
JP2011000005A
Publication Date:
February 05, 2014
Filing Date:
January 01, 2011
Export Citation:
Assignee:
Canon Inc
International Classes:
H01L21/027; G05D3/12
Domestic Patent References:
| JP2004260116A | ||||
| JP2003133216A | ||||
| JP2005286164A | ||||
| JP2002110511A |
Foreign References:
| WO2005008752A1 |
Attorney, Agent or Firm:
Yasunori Otsuka
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu