Title:
露光装置、露光方法、及びデバイス製造方法
Document Type and Number:
Japanese Patent JP5287901
Kind Code:
B2
Abstract:
The present disclosure relates to an exposure apparatus that exposes a substrate with an energy beam via a projection optical system and liquid, the apparatus comprising:
a first table (TB1) that is movable while the substrate is mounted thereon;
a second table (TB2) which is movable independently from the first table and on which a substrate is mounted; and
a drive system that moves the first and second tables with respect to the projection optical system, wherein
one of the first and second tables is replaced with the other of the first and second tables while maintaining the liquid just below the projection optical system, by moving the first and second tables in a close state below the projection optical system.
Inventors:
Akimitsu Ebihara
Application Number:
JP2011037041A
Publication Date:
September 11, 2013
Filing Date:
February 23, 2011
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2000164504A | ||||
| JP2001118773A | ||||
| JP2003017404A | ||||
| JP2004289128A |
Foreign References:
| WO1998040791A1 | ||||
| WO2004090577A2 | ||||
| WO2004114380A1 | ||||
| WO2005074014A1 |
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Kazuya Nishi
Tadashi Takahashi
Kazuya Nishi