Title:
遮光手段を用いた露光装置及び露光方法
Document Type and Number:
Japanese Patent JP4345331
Kind Code:
B2
Abstract:
An aligner to expose any exposure area includes an exposure light source that emits an exposure beam having a specified width to expose the exposure area to light; a douser having a width corresponding to at least the width of the exposure beam; and a shading unit to prevent the exposure beam from reaching an area other than the exposure area by driving the douser to shut off part or all of the exposure beam. The aligner is capable of forming different exposure areas with high density and having a structure suitable to reduce the size of the entire unit.
Inventors:
Entrance Chiharu
Application Number:
JP2003072092A
Publication Date:
October 14, 2009
Filing Date:
March 17, 2003
Export Citation:
Assignee:
Seiko Epson Corporation
International Classes:
G03F7/20; H01L21/027; G03C5/00; G03C5/04; G03H1/22
Domestic Patent References:
| JP2000356855A | ||||
| JP8064505A | ||||
| JP3211813A | ||||
| JP9016062A | ||||
| JP9034341A |
Foreign References:
| WO2003010803A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Katsuro Tanaka
Shinji Oga
Katsuro Tanaka
Shinji Oga