To suppress the thermal deformation of a reticle and a stage device, etc., used for an exposure system for increasing the superposing precision.

A pattern formed on a reticle 1 under illumination light IL for exposure is transferred on each shot region on a wafer 3 coated with a photoresist through the intermediary of a projection optical system 2. In such a constitution, a substrate 1a of the reticle 1a, a reticle stage 4, a wafer holder 7 suck-holding a wafer 3 and Z chilled stage 8 are formed of a titanium silicate glass in the linear expansion coefficient at the normal temperature not exceeding 4ppm/K.