Title:
EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS
Document Type and Number:
Japanese Patent JP2016096148
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an extreme ultraviolet light source device, capable of extending a life of an optical element inside the device and outputting stable EUV light, during a burst operation.SOLUTION: In an extreme ultraviolet light source device, a target 13 is irradiated with a main pulse L1 to emit EUV light L generated by burst oscillation. The extreme ultraviolet light source device includes a burst control unit C1 for controlling such that, during a burst operation in which the burst oscillation is performed, the main pulse L1 is output while a driver laser 1 outputting the main pulse L1 is in a continuous emission operation, and, when continuous emission during the burst operation is paused, the target material 13 is prevented from being irradiated with the main pulse L1 at a plasma emission site P10 of the EUV light L to pause the emission of the EUV light L.SELECTED DRAWING: Figure 1
Inventors:
MORIYA MASATO
HAYASHI HIDEYUKI
ABE TORU
HAYASHI HIDEYUKI
ABE TORU
Application Number:
JP2015241546A
Publication Date:
May 26, 2016
Filing Date:
December 10, 2015
Export Citation:
Assignee:
GIGAPHOTON INC
International Classes:
H05G2/00; G03F7/20; H01S3/00; H01S3/10
Domestic Patent References:
| JP2008532232A | 2008-08-14 | |||
| JP2009500796A | 2009-01-08 |
Foreign References:
| WO2008048415A2 | 2008-04-24 |
Attorney, Agent or Firm:
Hosaka Enju