Title:
FABRIC STRUCTURE OF DUSTPROOF CLOTHES FOR CLEAN ROOM AND HANDLING OF SEMICONDUCTOR WAFER WEARING THE SAME DUSTPROOF CLOTHES
Document Type and Number:
Japanese Patent JP3737278
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain dustpoof clothes capable of capturing much dust on the inside of the dustproof clothes in contact with a wearer and scarcely sticking the dust to the outside of the dustproof clothes and excellent in strength.
SOLUTION: The dustproof clothes have a constitution for exposing more curved fibers 121 to 123 onto the inner surface than straight-line fibers 111 to 115 and straight-line fibers 124 and 125 and exposing the more straight-line fibers 111 to 115 and straight-line fibers 124 and 125 than the curved fibers 121 to 123 onto the outer surface so that the outer surface of the dustproof clothes has a smaller space for capturing dust than that of the inner surface thereof and the inner surface has a larger space for capturing the dust than that of the outer surface.
Inventors:
Tominaga
Application Number:
JP11062098A
Publication Date:
January 18, 2006
Filing Date:
April 21, 1998
Export Citation:
Assignee:
Oki Electric Industry Co., Ltd.
International Classes:
A41D13/00; A41D31/00; D03D1/00; D03D13/00; D03D15/00; (IPC1-7): A41D13/00; A41D31/00; A41D31/00; D03D1/00
Domestic Patent References:
| JP3220339A | ||||
| JP4136234A | ||||
| JP60147685U |
Attorney, Agent or Firm:
Kenji Onishi