Title:
Ｆｅ－Ｐｔ－ＢＮ系スパッタリングターゲット及びその製造方法
Document Type and Number:
Japanese Patent JP7462511
Kind Code:
B2
Abstract:
The present invention addresses the problem regarding particle generation in a Fe-Pt-BN-based sputtering target having a high relative density. This Fe-Pt-BN-based sputtering target is characterized by containing carbon (C) and boron oxide and BN or a non-magnetic component formed of boron oxide and BN, and by having a relative density of 88% or more, and an oxygen content more than 4000 wtppm but not more than 10,000 wtppm, and is characterized in that the ratio of a water soluble boron concentration (wt%) with respect to the total boron concentration (wt%) as determined through a specific procedure is 1.0% or more.
Inventors:
Takamitsu Yamamoto
Masahiro Nishiura
Kenta Kurose
Hironori Kobayashi
Yasunobu Watanabe
Tomoko Matsuda
Masahiro Nishiura
Kenta Kurose
Hironori Kobayashi
Yasunobu Watanabe
Tomoko Matsuda
Application Number:
JP2020136266A
Publication Date:
April 05, 2024
Filing Date:
August 12, 2020
Export Citation:
Assignee:
Tanaka Kikinzoku Kogyo Co., Ltd.
International Classes:
C23C14/34; C04B35/5835; C04B35/645; C22C1/05; G11B5/65; G11B5/708; G11B5/851
Domestic Patent References:
| JP2019189923A | ||||
| JP2019163515A |
Foreign References:
| WO2014185266A1 | ||||
| WO2014064995A1 |
Attorney, Agent or Firm:
Osamu Yamamoto
Toru Miyamae
Motoharu Nakanishi
Minako Matsuyama
Toru Miyamae
Motoharu Nakanishi
Minako Matsuyama