エチレン性不飽和化合物のアルコキシカルボニル化のための、フェロセン系化合物及びこれに基づくパラジウム触媒

Title:

エチレン性不飽和化合物のアルコキシカルボニル化のための、フェロセン系化合物及びこれに基づくパラジウム触媒

Document Type and Number:

Japanese Patent JP6840480

Kind Code:

B2

Abstract:

The invention relates to compounds of formula (I)whereR1, R2, R3, R4 are each independently selected from —(C1-C12)-alkyl, —(C3-C12)-cycloalkyl, —(C3-C12)-heterocycloalkyl, —(C6-C20)-aryl, —(C3-C20)-heteroaryl;at least one of the R1, R2, R3, R4 radicals is a —(C3-C20)-heteroaryl radical;andR1, R2, R3, R4, if they are —(C1-C12)-alkyl, —(C3-C12)-cycloalkyl, —(C3-C12)-heterocycloalkyl, —(C6-C20)-aryl or —(C3-C20)-heteroaryl,may each independently be substituted by one or more substituents selected from —(C1-C12)-alkyl, —(C3-C12)-cycloalkyl, —(C3-C12)-heterocycloalkyl, —O—(C1-C12)-alkyl, —O—(C1-C12)-alkyl-(C6-C20)-aryl, —O—(C3-C12)-cycloalkyl, —S—(C1-C12)-alkyl, —S—(C3-C12)-cycloalkyl, —COO—(C1-C12)-alkyl, —COO—(C3-C12)-cycloalkyl, —CONH—(C1-C12)-alkyl, —CONH—(C3-C12)-cycloalkyl, —CO—(C1-C12)-alkyl, —CO—(C3-C12)-cycloalkyl, —N—[(C1-C12)-alkyl]2, —(C6-C20)-aryl, —(C6-C20)-aryl-(C1-C12)-alkyl, —(C6-C20)-aryl-O—(C1-C12)-alkyl, —(C3-C20)-heteroaryl, —(C3-C20)-heteroaryl-(C1-C12)-alkyl, —(C3-C20)-heteroaryl-O—(C1-C12)-alkyl, —COOH, —OH, —SO3H, —NH2, halogen;and to the use thereof as ligands in alkoxycarbonylation.

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Inventors:

Kai Dong
Hellfried Neumann
Ralph Jackstel
Matthias Beller
Robert Frank
Dieter Hess
Katerin Marie Divara
Dirk Fridag
Frank geilen

Application Number:

JP2016141022A

Publication Date:

March 10, 2021

Filing Date:

July 19, 2016

Export Citation:

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Assignee:

Evonik Operations Game Beher

International Classes:

C07F19/00; B01J31/28; C07C67/38; C07C69/24; C07C69/34; C07C69/533; C07C69/608; C07C69/74; C07C69/75; C07F9/58; C07F15/00; C07F17/02

Domestic Patent References:

JP9501691A
JP64090222A
JP2013516449A
JP4215851A

Foreign References:

WO2012111737A1
US5679831

Other References:

European Journal of Organic Chemistry,2012年,2012(21),p.4018-4033

Attorney, Agent or Firm:

Patent Business Corporation Ashitaba International Patent Office
Kenji Akatsuka
Yasuyuki Sakata
Ken Shibuya

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