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Title:
FIELD EFFECT TRANSISTOR AND MANUFACTURING METHOD THEREOF
Document Type and Number:
Japanese Patent JP2007027366
Kind Code:
A
Abstract:

To provide a field effect transistor which assures a large ON/OFF ratio in addition to a large field effect mobility, and can also be manufactured with the simplified method.

The field effect transistor comprises a semiconductor active layer 6, a gate electrode 2, a source electrode 4, and a drain electrode 5. The semiconductor active layer 6 is formed of a layer including at least one liquid crystal compound having a polymerization group, and a layer including at least a kind of compound having a photosensitive isomerization group or a layer including at least a kind of compound having both photosensitive isomerization group and liquid crystal functional group.


Inventors:
OKAMURA HISASHI
OKAZAKI MASAKI
Application Number:
JP2005206687A
Publication Date:
February 01, 2007
Filing Date:
July 15, 2005
Export Citation:
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Assignee:
FUJIFILM HOLDINGS CORP
International Classes:
H01L29/786; H01L51/05; H01L51/30; H01L51/40
Attorney, Agent or Firm:
Patent Service Corporation Patent Office Sykes