Title:
電界放射装置
Document Type and Number:
Japanese Patent JP5044005
Kind Code:
B2
Abstract:
In the present invention, heat dissipation is improved by extending the creepage distance in a vacuum vessel according to the size of a flange portion, without lengthening the vacuum vessel in the direction in which an electron beam is emitted. A vacuum vessel (20) in which a flange portion (20a) having a hollow portion between a cold cathode (9) and an anode (11) is formed is used. One example is a vacuum vessel (20) in which a cold cathode vessel (21) and an anode vessel (22), both cylindrically shaped, are communicated with each other and a hollow flange portion (20a) is formed between the vessels (21, 22). A focusing electrode (14) and a getter material (15), for example, are disposed in the hollow portion of the flange portion (20a). A cold cathode (9) which has a guard electrode on the outer side of the periphery of a carbon film structure (10) formed on a substrate (7) may be used. The carbon film structure (10) may be formed in the middle of an electrode surface of the substrate (7).
Inventors:
Yoshihisa Ishiguro
Haba Houki
Haba Houki
Application Number:
JP2010250087A
Publication Date:
October 10, 2012
Filing Date:
November 08, 2010
Export Citation:
Assignee:
Micro x Japan Co., Ltd.
International Classes:
H01J5/02; G21K5/00; G21K5/02; H01J1/304; H01J1/46; H01J7/24; H05G1/04; H01J35/16
Domestic Patent References:
| JP2005032638A | ||||
| JP55039104A | ||||
| JP56137358U | ||||
| JP2010056062A | ||||
| JP60097531A | ||||
| JP2011119084A |
Foreign References:
| WO2010150438A1 |
Attorney, Agent or Firm:
Sadayoshi Igarashi