To provide a method for uniformly and easily depositing a film having a diffusion-blocking layer on an interface with a base material at low cost.
In the film depositing method, a film comprising a diffusion-blocking layer 3 and a coating layer 4 on a base material 1 is deposited on the surface of the base material 1. The method includes a preliminary oxidizing step of oxidizing the base material 1 to form a base material oxide layer 2, and a coating step of depositing a film comprising the diffusion-blocking layer 3 and the coating layer 4 by coating the surface of the base material with a coating material including at least one alloy or compound containing an element to generate oxide of the generation enthalpy lower than that of oxide of the base material oxide layer 2.
SHOBU KAZUHISA
HIRAI HISATOSHI
SAKAMOTO MITSURU
Next Patent: HIGH-PURITY SPONGE IRON AND MANUFACTURING METHOD THEREFOR