PURPOSE: To prevent a film part to be processed from being stained and film from being damaged when the film is cleaned and to simplify maintenance.

CONSTITUTION: Both nozzles 22 and 23 of a film cleaning mechanism 20 are set on the upstream side of a read part 8. Since a position where the film is cleaned by the mechanism 20 is set in the vicinity of the read part 8, the film part to be processed reaches the read part 8 just after air-blast cleaning by the mechanism 20 at the time of driving the film. The film is cleaned by air blast, so that the mechanism 20 does not come in contact with the film H at the time of cleaning the film. Furthermore, the film is cleaned in a non-contact system, so that exchange and the cleaning of parts which are needed in the conventional manner are not needed.