Title:
成膜装置及び成膜方法
Document Type and Number:
Japanese Patent JP5476227
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an assist mechanism and assist method for conveying a heavy load, suitable for conveying a heavy load, in particular two-dimensionally, in vacuum, and to provide a device and method for film deposition applying the assist mechanism and assist method.SOLUTION: A film deposition device has a main shaft for conveying a heavy load one-dimensionally or two-dimensionally. In performing heavy load conveying assistance to reduce the load of the main shaft, the conveyance is performed via a link unit including a link having one end rotatably fixed to a wall of a vacuum chamber and the other end having the heavy load rotatably provided, and torque is applied to the one end by an assistance shaft so that the load of the main shaft driving the heavy load is reduced.
Inventors:
Kentaro Koikawa
Koichi Yanagisawa
Hideaki Kojima
Koichi Yanagisawa
Hideaki Kojima
Application Number:
JP2010147454A
Publication Date:
April 23, 2014
Filing Date:
June 29, 2010
Export Citation:
Assignee:
Hitachi High-Technologies Corporation
International Classes:
C23C14/56; C23C14/24; H01L51/50; H05B33/10
Domestic Patent References:
| JP9291362A | ||||
| JP2010080230A | ||||
| JP2004035964A | ||||
| JP2005063952A |
Attorney, Agent or Firm:
Polaire Patent Business Corporation