Title:
成膜装置及びこれに使用する原料供給装置、成膜方法
Document Type and Number:
Japanese Patent JP3973605
Kind Code:
B2
Abstract:
A film-formation apparatus includes a film-formation chamber and a source gas supplying apparatus supplying a source gas to the film-formation chamber together with a carrier gas, wherein the source gas supplying apparatus includes a concentration detector detecting a concentration of the source gas and a gas flow controller controlling a flow rate of an inert gas added to the carrier gas based on a result of measurement of the concentration of the source gas obtained by the concentration detector.
Inventors:
山▲崎▼ 英亮
Yumiko Kono
Yumiko Kono
Application Number:
JP2003191044A
Publication Date:
September 12, 2007
Filing Date:
July 03, 2003
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
C23C16/455; C23C16/16; C23C16/448; C23C16/52; G01N21/35; G01N21/3504; G01N21/61; G05D11/13; H01L21/02; H01L21/31
Domestic Patent References:
| JP47010730Y1 | ||||
| JP7188932A | ||||
| JP2001214270A | ||||
| JP3267374A | ||||
| JP6249779A | ||||
| JP2002181704A | ||||
| JP2001509595A | ||||
| JP6145992A |
Attorney, Agent or Firm:
Tadahiko Ito