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Title:
膜形成用組成物、膜、レジスト下層膜の形成方法、パターニングされた基板の製造方法及び化合物
Document Type and Number:
Japanese Patent JP7041358
Kind Code:
B2
Abstract:
The purpose of the present invention is to provide: a composition for forming a film, the composition being capable of forming a film which has excellent flatness as well as excellent solvent resistance, etching resistance, and heat resistance; a film; a method for forming a resist underlayer film; a method for manufacturing a patterned substrate; and a compound. The present invention pertains to a composition which is for forming a film and contains a solvent and a compound having a group represented by formula (1) below. In formula (1), R1-R4 are each independently a hydrogen atom or a monovalent organic group having 1-20 carbon atoms, or exhibit a ring structure having 3-20 ring members, the ring structure being formed along with carbon atoms or carbon chains that are bonded by these groups. Ar1 is a group obtained by removing from an arene, having 6-20 carbon atoms, the hydrogen atoms on (n+3) aromatic rings. R5 is a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1-20 carbon atoms. n is an integer from 0 to 9.

Inventors:
Naoya Nosaka
Takeshi Wakamatsu
Tsubasa Abe
Hiroshi Matsumura
Masayuki Miyake
Yoshio Takimoto
Application Number:
JP2018520768A
Publication Date:
March 24, 2022
Filing Date:
May 15, 2017
Export Citation:
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Assignee:
JSR CORPORATION
International Classes:
C08L101/00; C07D311/74; C08F34/02; C08K5/15; G03F7/11; H01L21/027
Domestic Patent References:
JP2012173675A
JP2004155738A
JP8295690A
JP2017119671A
Foreign References:
WO2016013598A1
CN103265706B
Other References:
Y.Morel et al.,Nonlinear absorption spectra of transparent organic crystals for opticallimiting applications at vis,Synthetic Metals,2000年,Vol.115,p.265-268
Y.Morel et al.,Nonlinear absorption spectra of transparent organic crystals for opticallimiting applications at vis,Synthetic Metals,2000年,Vol.115,p.265-268
Attorney, Agent or Firm:
Amano Kazunori