Title:
皮膜形成用組成物、該皮膜形成用組成物を塗工してなるガラス基材、及び、該ガラス基材を用いてなるタッチパネル
Document Type and Number:
Japanese Patent JP7227738
Kind Code:
B2
Abstract:
The purpose of the present invention is to provide a film forming composition which has excellent developability and stability during storage, and which, by forming a cured film thereof by coating, has excellent transparency and adhesion to a transparent substrate or an electrode, and has high insulating properties even in a thin film thereof. The present invention relates to a film forming composition characterized by containing a polysiloxane compound satisfying condition 1 below, a polythiol compound not including a silicon atom in the molecule thereof, a polymerization initiator, and an organic solvent. The following are included as materials constituting the polysiloxane compound: a silane-based compound (A) that is at least one compound selected from the group consisting of tetraalkoxysilane and bis(trialkoxysilyl)alkane; a silane-based compound (B) that is at least one compound selected from the group consisting of alkyltrialkoxysilane, dialkyldialkoxysilane, cycloalkyltrialkoxysilane, vinyltrialkoxysilane, and phenyltrialkoxysilane; and a silane-based compound (C) having a radical-polymerizable unsaturated double bond.
Inventors:
Keisuke Ikedo
Yu Matsuoka
Okamoto victory
Nakano Tadashi
Yu Matsuoka
Okamoto victory
Nakano Tadashi
Application Number:
JP2018209668A
Publication Date:
February 22, 2023
Filing Date:
November 07, 2018
Export Citation:
Assignee:
SAKATA INX CORP.
International Classes:
C09D183/07; C09D7/63; G03F7/004; G03F7/027; G03F7/075; G03F7/20; G06F3/041
Domestic Patent References:
| JP2012212114A | ||||
| JP2015193820A | ||||
| JP2018076443A |
Foreign References:
| WO2017150421A1 | ||||
| WO2017150420A1 | ||||
| WO2014185435A1 |
Attorney, Agent or Firm:
Patent Attorney Firm WisePlus