Title:
成膜装置、および、成膜方法
Document Type and Number:
Japanese Patent JP6983030
Kind Code:
B2
Abstract:
To provide a film deposition apparatus capable of suppressing a variation of a uniaxial magnetic anisotropy of a magnetic film within a substrate plane, and a film deposition method.SOLUTION: A film deposition apparatus includes a target 31 including a magnetic material capable of generating a uniaxial magnetic anisotropy, a first magnetic circuit 20 which includes multiple magnets 21 arranged at a predetermined pitch in a region facing the target 31, and forms a horizontal magnetic field HM parallel to a substrate S arranged between the target 31 and the multiple magnets 21 between the substrate S and target 31, and a first position change unit 18 which changes a position of the first magnetic circuit 20 to the substrate S along a first direction D1 between the first position and a second position separated at less than predetermined pitch from the first position. Each of the magnets 21 is arranged along the first direction D1 at a predetermined pitch.SELECTED DRAWING: Figure 3
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Inventors:
Atsuhito Ibori
Fujinaga Tetsushi
Noriaki Tani
Harunori Iwai
Yosuke Kobayashi
Fujinaga Tetsushi
Noriaki Tani
Harunori Iwai
Yosuke Kobayashi
Application Number:
JP2017199455A
Publication Date:
December 17, 2021
Filing Date:
October 13, 2017
Export Citation:
Assignee:
ULVAC, Inc.
International Classes:
C23C14/35; H01F41/18; H01L43/12
Foreign References:
| WO2017169448A1 |
Attorney, Agent or Firm:
Makoto Onda
Hironobu Onda
Hironobu Onda
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