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Patent Searching and Data


Title:
FILM FORMING MONITOR
Document Type and Number:
Japanese Patent JPS6444844
Kind Code:
A
Abstract:

PURPOSE: To observe the crystallinity and magnetic characteristic of a formed film on the spot at the time of formation, by applying a magnetic field to a substrate and measuring the change of the flux transmitting through the formed film by a superconducting quantum interference meter.

CONSTITUTION: A growth chamber 21 is evacuated by an oil diffusion pump 22 and a rotary pump 23. A substrate 2 is made of a heat resistant resin and fixed to a substrate holder 1 to be heated by an infrared lamp 3. Cobalt/ chromium 31 being a vapor deposition material is set to a vapor deposition boat 32 and evaporated by resistance heating to be formed into a membrane on the substrate 2. The magnetic field generated by a magnetic field generating coil 41 is uniformly applied to the substrate and transmits through the substrate 2 to be monitored by a superconducting quantum interference meter 11 cooled by a liquid nitrogen shroud 12. The signal from the interference meter 11 is inputted to a microcomputer 51 to be analyzed. By this method, the crystallinity and magnetic characteristic of the film at the time of formation can be monitored on the spot and, therefore, the characteristic of the formed film is enhanced and a film forming process can be elucidated.


Inventors:
MIYAUCHI AKIHIRO
TANAKA TAKESHI
ONOSE HIDEKATSU
OGAMI MICHIO
Application Number:
JP20172787A
Publication Date:
February 17, 1989
Filing Date:
August 14, 1987
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
G01R33/12; G01N27/72; (IPC1-7): G01N27/72; G01R33/12
Attorney, Agent or Firm:
Katsuo Ogawa