Title:
FILTER UNIT AND PHOTOSENSITIVE MATERIAL DEVELOPMENT PROCESSOR USING IT
Document Type and Number:
Japanese Patent JP3904494
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To surely arrest foreign matter in processing liquid and to maintain quality of a photosensitive material.
SOLUTION: A vent hole 59 for eliminating bubbles 60 within a filter unit 41 is provided at a tip end 51a of a core material 51 for holding a filter 50, and a cap 52 is attached to the hole. The cap is made of a material with a specific gravity smaller than that of a rinsing water, and is set vertically movable between a blocking position of the vent hole 59 and an open position for passing the bubbles 60 from the hole 60. When introducing the rinsing water into a first rinsing tank 12, the cap is floated from the hole 59 to easily eliminate bubbles 60. When circulating the water, a negative pressure is applied to the lower part of the cap 52 to automatically block the hole 59 with a main body 52b.
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Inventors:
Katsuhiko Tanaka
Application Number:
JP2002239805A
Publication Date:
April 11, 2007
Filing Date:
August 20, 2002
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03D3/02; B01D29/00; B01D29/07; B01D35/02; G03D3/00; (IPC1-7): G03D3/02; B01D29/00; B01D29/07; B01D35/02; G03D3/00
Domestic Patent References:
| JP2002014451A | ||||
| JP9222714A | ||||
| JP5107715A | ||||
| JP4199151A | ||||
| JP63160908U |
Attorney, Agent or Firm:
Kazunori Kobayashi
Shigeru Iijima
Kobayashi Hideyoshi
Shigeru Iijima
Kobayashi Hideyoshi
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