Title:
FINE PATTERN FORMATION
Document Type and Number:
Japanese Patent JPS582026
Kind Code:
A
Abstract:
PURPOSE:To enhance the resolution of a fine pattern, by applying resist material on a substrate, then to develop in developer containing xylene as poor solvent after pattern forming exposure to the material. CONSTITUTION:The resist material constituting of copolymer of poly-N-vinyl carbazole or N-vinyl carbazole and monomer available for polymerization therewith is applied on the substrate according to a normal method for pattern forming exposure. Thereafter, a fine pattern is formed by developing in developer containing xylene as poor solvent or rinsing in rinsing liquid constituted of xylene after development. Thus, when forming the fine pattern, the obtained pattern can be prevented from deformation with the resolution thereof enhanced from 1mum to the order of submicron.
Inventors:
NAITOU JIROU
YONEDA YASUHIRO
KITAMURA TATEO
KITAKOUJI TOSHISUKE
YONEDA YASUHIRO
KITAMURA TATEO
KITAKOUJI TOSHISUKE
Application Number:
JP9975781A
Publication Date:
January 07, 1983
Filing Date:
June 29, 1981
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
H01L21/30; G03F7/32; H01L21/027; (IPC1-7): H01L21/30
Attorney, Agent or Firm:
Aoki Akira
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