Title:
FLANGE AND APPARATUS FOR PROCESSING SUBSTRATES
Document Type and Number:
Japanese Patent JP2021184462
Kind Code:
A
Abstract:
To provide a flange with improved temperature control.SOLUTION: The disclosure relates to a flange for a process tube in an apparatus for processing substrates, e.g., a vertical furnace. The flange may be provided with an opening for in use giving access to the process chamber of the process tube, and a cooling channel allowing a cooling fluid to flow therethrough to cool the flange. A material with a heat conductivity of 0.1-40 W/m K may be at least partially provided between the cooling fluid and the rest of the flange.SELECTED DRAWING: Figure 1
Inventors:
JEROEN DE JONGE
SUMIT SACHDEVA
LUCIAN JDIRA
JULIEN LAURENTIUS ANTONIUS MARIA KEIJSER
THEODORUS G M OOSTERLAKEN
SUMIT SACHDEVA
LUCIAN JDIRA
JULIEN LAURENTIUS ANTONIUS MARIA KEIJSER
THEODORUS G M OOSTERLAKEN
Application Number:
JP2021083061A
Publication Date:
December 02, 2021
Filing Date:
May 17, 2021
Export Citation:
Assignee:
ASM IP HOLDING BV
International Classes:
H01L21/205; C30B33/02; H01L21/22
Attorney, Agent or Firm:
Yasuhiko Murayama
Shinya Mitsuhiro
Tatsuhiko Abe
Shinya Mitsuhiro
Tatsuhiko Abe