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Title:
三相系モノリス触媒反応器における流れ制御
Document Type and Number:
Japanese Patent JP2004525750
Kind Code:
A
Abstract:
A method is disclosed for maintaining a volumetric gas to liquid ratio in a segmented gas/liquid flow along a reactor of monolithic catalyst beds in series. The present invention includes the steps of: initiating the segmented gas/liquid flow at a first end of the reactor by introducing feed liquid and feed gas both at a predetermined volume and a predetermined flow rate; injecting an additional amount of gas at least once into any of the spaces between catalyst beds; and combining the segments of the segmented gas/liquid flow at a second end of the reactor. The injection of gas is controlled such that the segmented gas/liquid flow can be maintained near or at the Taylor regime.

Inventors:
Le Tour Noor, Didier
Sorensen, Charles M Jr.
Whale, Pierre
Application Number:
JP2002552667A
Publication Date:
August 26, 2004
Filing Date:
December 20, 2001
Export Citation:
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Assignee:
CORNING INCORPORATED
International Classes:
B01J35/04; B01J4/00; B01J8/04; B01J19/00; B01J19/24; C07B61/00; (IPC1-7): B01J19/00; B01J19/24; B01J35/04; C07B61/00
Domestic Patent References:
JPH02187150A1990-07-23
JPH02263713A1990-10-26
JPH0930992A1997-02-04
Foreign References:
WO1998016463A11998-04-23
Attorney, Agent or Firm:
Yanagita Seiji
Go Sakuma