Title:
流体系クリーニング方法およびシステム
Document Type and Number:
Japanese Patent JP4345044
Kind Code:
B2
Abstract:
A method for cleaning or sterilizing objects in a liquid fluid cleaning system comprising a high-pressure storing/working vessel, a cleaning chamber, and a low-pressure supply vessel, the method comprising the steps of loading the cleaning chamber with objects to be cleaned or sterilized; supplying cleaning fluid to the cleaning chamber from the low-pressure supply vessel by means of pressure difference; supplying cleaning fluid to the cleaning chamber from the high-pressure storing/working vessel; cleaning the objects in the cleaning chamber with the cleaning fluid; transferring cleaning fluid from the cleaning chamber to the high-pressure storing/working vessel; and unloading the cleaned objects from the cleaning chamber.
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Inventors:
Lindkwist, Kenneth
Souvenson, Orvual
Souvenson, Orvual
Application Number:
JP2000572441A
Publication Date:
October 14, 2009
Filing Date:
August 27, 1999
Export Citation:
Assignee:
Argea Actu Evolag
International Classes:
D06F43/00; D06F43/08
Domestic Patent References:
| JP7508904A | ||||
| JP7501007A | ||||
| JP10192590A |
Foreign References:
| WO1997033031A1 |
Attorney, Agent or Firm:
Osamu Nakahira