Title:
フルオレン含有オキシムエステル類光開始剤、その合成、それを含有する感光性樹脂組成物及びその使用
Document Type and Number:
Japanese Patent JP6641468
Kind Code:
B2
Abstract:
Disclosed are a photoinitiator containing a fluorene oxime ester, as shown by the following formula (I), synthesis therefor, a photosensitive resin composition containing same, and a use thereof. The compound is simple in synthesis and low in cost, and has a good solubility when applied to the photocuring field, has an excellent storage stability and film-forming performance, low exposure demand, and excellent developing property and pattern integrality. The photosensitive resin composition contains an ultraviolet photosensitive prepolymer resin, an active diluent monomer, the photoinitiator containing a fluorene oxime ester of the present application, and optionally, a colorant and an alkali-soluble resin. The composition has a high sensitivity and a good developing property, a high resolution and excellent adhesiveness to a substrate; it is very suitable for preparing a black matrix with a high light-shielding property, and a color filter and a liquid crystal display device with a high fineness and a high quality; and can also be applied in aspects such as in a light spacer and a rib grid, a photoresist, a wet film and a dry film.
Inventors:
Zen Akaharu
Application Number:
JP2018517895A
Publication Date:
February 05, 2020
Filing Date:
September 22, 2016
Export Citation:
Assignee:
CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS Co., Ltd.
CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO.,LTD.
CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO.,LTD.
International Classes:
C08F2/50; C08F2/44; C08F20/00; G02B5/20; G03F7/004; G03F7/027; G03F7/031
Foreign References:
| WO2014050738A1 | ||||
| WO2016010036A1 |
Attorney, Agent or Firm:
Keiichiro Saikyo