Title:
ミクロ平版印刷法のための弗素化コポリマー
Document Type and Number:
Japanese Patent JP2005519167
Kind Code:
A
Abstract:
Fluorinated copolymers useful in photoresist compositions and associated processes for microlithography are described. These copolymers are comprised of a fluoroalcohol or protected fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in basic media to these materials and a repeat unit derived from an acrylate monomer containing a fluoroalkyl group or a hydroxyl substituted alkyl group. The materials of this invention have high UV transparency, particularly at 193 and 157 nm, which makes them highly useful for lithography at these short wavelengths.
Inventors:
Andrew Edward Failing
Frank El. Shah The Third
Gary Newton Taylor
Frank El. Shah The Third
Gary Newton Taylor
Application Number:
JP2003573494A
Publication Date:
June 30, 2005
Filing Date:
February 26, 2003
Export Citation:
Assignee:
E.I.DU PONT DE NEMOURS AND COMPANY
International Classes:
C08F12/20; C08F216/14; C08F220/10; C08F232/00; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): C08F220/10; C08F216/14; C08F232/00; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Yoshikazu Tani
Kazuo Abe
Kazuo Abe