Title:
FLUORINE-CONTAINING ALICYCLIC UNSATURATED COMPOUND, POLYMER THEREOF, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION
Document Type and Number:
Japanese Patent JP2004175721
Kind Code:
A
Abstract:
To provide a polymer useful as a chemical amplification resist for lithography using rays ≤190 nm wavelength, high in transparency to exposure light and excellent in substrate adhesion and dry etching resistance, and to provide a monomeric compound for the polymer.
A fluorine-containing alicyclic unsaturated compound represented by general formula(1)( wherein, at least one of R1 and R2 is a fluorine atom or fluorinated alkyl group ) is provided. The polymer is obtained by polymerizing the compound or a polymeric precursor including the compound.
Inventors:
MAEDA KATSUMI
NAKANO KAICHIRO
NAKANO KAICHIRO
Application Number:
JP2002343843A
Publication Date:
June 24, 2004
Filing Date:
November 27, 2002
Export Citation:
Assignee:
NEC CORP
International Classes:
G03F7/039; C07C59/62; C07C69/734; C08F32/00; C08F34/00; C08G61/00; H01L21/027; (IPC1-7): C07C59/62; C07C69/734; C08F32/00; C08F34/00; C08G61/00; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Nobuyuki Kaneda
Katsuhiro Ito
Ishibashi Masayuki
Katsuhiro Ito
Ishibashi Masayuki