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Title:
FLUORINE-CONTAINING POLYMER, ITS MANUFACTURING PROCESS AND ELECTRIC INSULATION MATERIAL
Document Type and Number:
Japanese Patent JP2004256666
Kind Code:
A
Abstract:

To provide a fluorine-containing polymer excellent in insulation and transparency in the low wavelength region.

The fluorine-containing polymer contains (A) a repeating unit as expressed by formula (1) in the molecule in an amount of 1-100 mol% of the total of the polymer. The polymer contains fluorine atoms in an amount of ≥ 50 wt.%, has a relative permittivity of ≤ 2.5, the number of foreign matters with ≥ 100 μm is ≤ 5 per 10 mm2, when the polymer is molded into a molding with a thickness of 1 mm. The manufacturing process for the polymer is presented. The electric insulation material comprises the polymer. In formula (1), R1, R2, R3 and R4 are each independently a hydrogen atom, a fluorine atom, or a chlorine atom provided that at least one of R1-R4 is a fluorine atom; n is an integer of 1-4; when n is ≥ 2, the groups shown as (CR3R4) may be identical or different.


Inventors:
UEJIMA MITSUGI
Application Number:
JP2003048769A
Publication Date:
September 16, 2004
Filing Date:
February 26, 2003
Export Citation:
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Assignee:
NIPPON ZEON CO
International Classes:
C08F4/36; C08F32/04; H01B3/44; (IPC1-7): C08F32/04; C08F4/36; H01B3/44
Attorney, Agent or Firm:
Haruhito Oishi