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Title:
FLUORINE-CONTAINING SILICONE RESIN, IT PRODUCTION, FLUORINE-CONTAINING SILICONE RESIN COMPOSITION, METHOD FOR FORMING FLUORINE-CONTAINING COATING GLASS FILM AND METHOD FOR FORMING PATTERN OF THE FILM
Document Type and Number:
Japanese Patent JPH09176320
Kind Code:
A
Abstract:

To stably obtain a fluorine-containing silicone resin useful as a raw material for forming a fluorine-containing coating glass film having a chemically stable structure by condensing a specific fluorosilane derivative.

In this fluorine-containing silicon resin, one silicon atom is bound to each of a part or all of silicon atoms constituting a main chain. The objective resin is obtained by condensing one of fluorosilane derivatives expressed by the formula (R1 to R3 are each an alkyl, an aryl or an acyl) or two or more fluorosilane derivatives expressed by the formula, and preferably containing an acid generating agent such as triphenylsulfonium trifluoromethanesulfonate.


Inventors:
ITO TOSHIO
KOSUGE MAKI
Application Number:
JP34224895A
Publication Date:
July 08, 1997
Filing Date:
December 28, 1995
Export Citation:
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Assignee:
OKI ELECTRIC IND CO LTD
International Classes:
C03C3/00; C08G77/22; C08G77/24; C08L83/04; C08L83/08; C09D183/04; C09D183/08; H01L21/312; H01L21/316; (IPC1-7): C08G77/24; C03C3/00; C08L83/08; C09D183/08; H01L21/312; H01L21/316
Attorney, Agent or Firm:
Takashi Ogaki