FLUOROALKYL GROUP-CONTAINING PHOSPHONIUM OLIGOMERS, THEIR PRODUCTION, AND ANTIMICROBIAL AGENT, ANTIMICROBIAL SURFACTANT AND ANTIMICROBIAL RESIN COMPOSITION

Title:

FLUOROALKYL GROUP-CONTAINING PHOSPHONIUM OLIGOMERS, THEIR PRODUCTION, AND ANTIMICROBIAL AGENT, ANTIMICROBIAL SURFACTANT AND ANTIMICROBIAL RESIN COMPOSITION

Document Type and Number:

Japanese Patent JPH11246577

Kind Code:

A

Abstract:

To produce new compounds useful as antimicrobial agents, antimicrobial surfactants and antimicrobial resin compositions.

The compounds represented by formula I [R1 and R2 are each (CF2)m1Y (m1 is l-10; Y is H, F or Cl) or the like; A is an alkylene; R3 is H or methyl; R4 to R6 are each a 1-18C alkyl; X is a halogen; (n) is 1-100], are obtained by reacting fluoroalkanoyl peroxides represented by formula II with a phosphonium salt represented by formula III and having (meth)acrylic group.

Inventors:

SAWADA HIDEO
SHIMURA SEIJI
SUGIYA TADASHI
WATANABE TSUTOMU

Application Number:

JP5909598A

Publication Date:

September 14, 1999

Filing Date:

February 25, 1998

Export Citation:

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Assignee:

NIPPON CHEMICAL IND

International Classes:

C09K23/52; A01N25/10; A01N57/34; C07F9/54; C08F30/02; C08L43/02; (IPC1-7): C07F9/54; A01N25/10; A01N57/34; B01F17/52; C08F30/02; C08L43/02

Attorney, Agent or Firm:

Tokuhiro Watanabe

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