Title:
FORMATION OF CARBON THIN FILM BY SPUTTERING
Document Type and Number:
Japanese Patent JPH01160815
Kind Code:
A
Abstract:
PURPOSE:To readily obtain carbon thin film with such excellent surface precision and strength as to be adequately put to practical use as a protective film for magnetic recording discs, by using a facing target-type sputtering means with the sputtering gas pressure at or below a specified level. CONSTITUTION:A voltage is applied on targets 3, 3 made of carbon, as the anode, arranged facing each other under a sputtering gas pressure of <=3.0m Torr to form a carbon thin film on the surface of a base plate 6 placed on the side of the magnetic field space 4 between said targets 3, 3. The sputtering gas is, e.g., argon or another inert gas. The sputtering gas pressure during sputtering operation has only to be set at <=3.0m Torr irrespective of the kind of the gas to be used.
Inventors:
NAOE MASAHIKO
HOSHI YOICHI
HIRATA TOYOAKI
HOSHI YOICHI
HIRATA TOYOAKI
Application Number:
JP31840787A
Publication Date:
June 23, 1989
Filing Date:
December 15, 1987
Export Citation:
Assignee:
OSAKA SHINKU KIKI SEISAKUSHO
International Classes:
C01B31/04; C23C14/06; C23C14/34; G11B5/73; G11B5/738; G11B5/84; (IPC1-7): C01B31/04; C23C14/06; C23C14/34; G11B5/704; G11B5/84
Attorney, Agent or Firm:
Fujimoto Noboru