PURPOSE: To form a fine pattern in excellent contrast by a method wherein a photomask, on which a contrast intensifying film to be used to emphasize the intensity of light corresponding to a mask pattern is coated, is used.

CONSTITUTION: A CEL (contrast intensifying film) 2 is coated on the surface where the mask pattern of a photomask 1 is formed, and when a light 5 is made to irradiate on the photomask 1, the light 5 passes through an aperture part only. When transmitted light is made incident on the CEL 2, a bleaching action is generated by the intensity of the transmitted light, transmittance is increased in the bleached region 6, the transmittance is made small on the region 7 which is not bleached because of the feebleness of the transmitted light, thereby enabling the improvement in the contrast remarkably. As a result, a fine pattern 10 can be formed in an excellent state of contrast.