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Patent Searching and Data


Title:
FORMATION OF MASK FOR X-RAY LITHOGRAPHY
Document Type and Number:
Japanese Patent JPS6068338
Kind Code:
A
Abstract:

PURPOSE: To form a mask with a simpler and quicker process by irradiating light to a photodecomposable resin layer to decompose said resin thereby separating a flat plate and a mask film body in the stage of transferring the mask film body on the flat plate onto a holding body.

CONSTITUTION: Chlorinated p-diazo diethyl aniline zinc chloride is dissolved in an epoxy resin soln. and the soln. is coated by spin-coating on a quartz flat plate 1 to provide a photodecomposable resin layer 2. A polyimide film 3 as an X-ray transmission layer, a gold pattern 4 as an X-ray absorption layer and a polyimide film 5 as an X-ray transmission layer for protection are successively laminated on the layer 2 to manufacture a mask film body 6. A toric holding body 7 coated with an adhesive agent on surface is adhered onto the film 5 and is cured. After the projecting part is removed, UV light is irradiated to a vertical direction 8 from the plate 1 side to decompose the resin 2. The resin layer is stripped by a thin blade.


Inventors:
KATOU HIDEO
Application Number:
JP17729083A
Publication Date:
April 18, 1985
Filing Date:
September 26, 1983
Export Citation:
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Assignee:
CANON KK
International Classes:
G03F1/00; G03F1/22; G03F1/68; H01L21/027; (IPC1-7): H01L21/30
Attorney, Agent or Firm:
Yamashita