PURPOSE: To enable formation of a sand blast resist image of high image precision, by coating a body surface with an unhardened liquid photosensitive resin and laminating a solid unhardened photosensitive resin sheet on this coated layer.
CONSTITUTION: The surface of a body, such as silicon wafer is thinly coated with a liquid unhardened photosensitive resin. A solid unhardened photosensitive resin sheet is laminated on this coated layer using a rubber roller. On this solid resin an image film is placed, exposed, and developed to form a resist image for sand blast. This method permits the resist layer to be fastly sticked to the body surface and to be prevented from stripping and deformation during sand blast, and thus, a high precision image to be formed on the body surface.
KONAKAWA TOMOO
YANAGIDA AKIO
| JPS50137201A | 1975-10-31 | |||
| JPS52110106A | 1977-09-16 |