Title:
FORMATION OF PIT
Document Type and Number:
Japanese Patent JP2773565
Kind Code:
B2
Abstract:
PURPOSE: To form short pits not possible heretofore on a negative resist by combining a contrast intensifying agent with the surface of the negative resist.
CONSTITUTION: The negative resist 11 is applied on a tempered glass substrate 10 and further the contrast intensifying agent 13 and a barrier coating material 12 for preventing the diffusion thereof with the negative resist are applied thereon from above. Beams transmit only the parts where the intensity of exposing beams is high by exposing the negative resist with the pits in this state. The region of the photosensitized negative resist is thus narrowed. The further shorter pits are formed by prolonging the developing time of the negative resist.
Inventors:
Naoki Omura
Kenichi Ishizuka
Shinichi Katsuta
Kazuhiko Yamada
Yokota Hitoshi
Kenichi Ishizuka
Shinichi Katsuta
Kazuhiko Yamada
Yokota Hitoshi
Application Number:
JP24020892A
Publication Date:
July 09, 1998
Filing Date:
September 09, 1992
Export Citation:
Assignee:
NEC
International Classes:
G11B7/26; (IPC1-7): G11B7/26
Domestic Patent References:
| JP3223760A |
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)