Title:
FORMATION OF RESIST PATTERN
Document Type and Number:
Japanese Patent JPS6043828
Kind Code:
A
Abstract:
PURPOSE:To contrive accomplishment of high sensitivity and stabilization of sensitivity of a resist film when exposing and developing processes are performed by a method wherein a plate to be processed is arranged horizontally in a housing vessel having a cooling gas introducing part and a gas sucking part, and cooling gas is supplied into the housing vessel in the state of laminar flow, thereby enabling to rapidly cool the resist film uniformly. CONSTITUTION:A resist mask is formed on a blank mask 13, and they are housed in a cassette 14 in such a manner that the resist film is facing upward. Cooling N2 gas is supplied into a high pressure reservoir 1, and a low pressure reservoir 6 is maintained at a decompressed state using a vacuum pump 7. After the resist film located on the blank mask in the cassette has been prebaked, the blank mask 13 is set in the tube main body 10 of an expanded tube 5 together with the cassette 14. The cooling N2 gas in the high pressure reservoir 1 is supplied to the expanded tube 5 in a rectified state utilizing the sucking action of the low pressure reservoir 6, and the resist mask on the blank mask 13 of the expanded tube 5 is rapidly cooled.
Inventors:
SHIGEMITSU FUMIAKI
USUDA KINYA
TSUCHIYA NOBUJI
USUDA KINYA
TSUCHIYA NOBUJI
Application Number:
JP15264683A
Publication Date:
March 08, 1985
Filing Date:
August 22, 1983
Export Citation:
Assignee:
TOSHIBA KK
International Classes:
G03F7/38; G03F7/20; H01L21/027; H01L21/30; (IPC1-7): G03F7/20
Attorney, Agent or Firm:
Takehiko Suzue